DocumentCode
1958962
Title
Stabilization of the Microwave Plasma Facility (MPF) by a microwave isolator
Author
Yu, Son-Cheol ; Kamath, Sanmati ; Roth
Author_Institution
UTK Plasma Sci. Lab., Tennessee Univ., Knoxville, TN, USA
fYear
1993
fDate
7-9 June 1993
Firstpage
213
Abstract
Summary form only given. A microwave isolator and a new tuner have been added to the UTK Microwave Plasma Facility (MPF), an approximately 200-liter steady-state, uniform plasma generated by 2 kW of 2.45 GHz microwave power. The uniform steady state plasma, before the addition of the microwave isolator, had an electron number density of about 6 /spl times/ 10/sup 16// electrons/m/sup 3/ and an electron kinetic temperature of 16 eV. The plasma was difficult to stabilize since the reflected power reacted with the magnetron source, changing its characteristics. The microwave isolator has successfully decoupled the reflected power from the load, thus facilitating the process of tuning the plasma. Additional tuning stubs in the microwave circuit have further enhanced the ease of tuning the plasma and minimizing the amount of reflected power.
Keywords
plasma production; 16 eV; 2 kW; 2.45 GHz; Microwave Plasma Facility; electron kinetic temperature; electron number density; magnetron source; microwave circuit; microwave isolator; reflected power; tuner; tuning stubs; uniform plasma; uniform steady state plasma; Circuit optimization; Electrons; Isolators; Microwave generation; Plasma density; Plasma properties; Plasma sources; Plasma temperature; Steady-state; Tuners;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location
Vancouver, BC, Canada
ISSN
0730-9244
Print_ISBN
0-7803-1360-7
Type
conf
DOI
10.1109/PLASMA.1993.593578
Filename
593578
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