• DocumentCode
    1960188
  • Title

    The study of low frequency noise of single-walled carbon nanotube transistors

  • Author

    Kim, Sunkook ; Chang, David ; Xuan, Yi ; Ye, Peide ; Mohammadi, Saeed

  • Author_Institution
    Purdue Univ., West Lafayette
  • fYear
    2007
  • fDate
    18-20 June 2007
  • Firstpage
    263
  • Lastpage
    264
  • Abstract
    In this paper, we report a top gate SWNT-FET with reduced hysteresis in the IV characteristics and extremely low 1/f noise. We have also investigated the source of 1/f noise in these devices and attributed the low noise property to low trap charges near the carbon nanotube substrate interface. The SWNT-FET devices reported here and shown schematically in Fig. 1(a), are fabricated on high resistivity Si substrate (rhoap10 KOmega) with a 500 nm thermal SiO2. Catalyst patterns are defined by UV photolithography with a 10 mum spacing and subsequent iron deposition and lift-off. Single-walled carbon nanotubes (SWNTs) are then synthesized by chemical vapor deposition (CVD) of methane on the substrate using iron catalyst.
  • Keywords
    1/f noise; carbon nanotubes; catalysts; chemical vapour deposition; field effect transistors; photolithography; substrates; 1/f noise; CVD; SWNT-FET devices; SiO2; UV photolithography; carbon nanotube substrate interface; chemical vapor deposition; field effect transistor; high resistivity Si substrate; iron catalyst; single-walled carbon nanotube transistor; size 10 mum; size 500 nm; Carbon nanotubes; Hafnium oxide; Hysteresis; Lithography; Low-frequency noise; Nanoscale devices; Noise figure; Noise measurement; Substrates; Working environment noise;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2007 65th Annual
  • Conference_Location
    Notre Dame, IN
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4244-1101-6
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2007.4373746
  • Filename
    4373746