Title :
Micro Knife-edge Optical Measurement Devices Fabricated by SOI and CMOS MEMS Processes
Author :
Chang, Tzu-Lin ; Tseng, Victor Farm-Guoo ; Chiu, Yi
Author_Institution :
Nat. Chiao Tung Univ., Hsinchu
fDate :
Aug. 12 2007-July 16 2007
Abstract :
The knife-edge method is a commonly used technique to characterize the optical profiles of laser beams or focused optical spots. In this paper, we present the design, fabrication, and test of a micro knife-edge scanner based on the micro-electromechanical-system (MEMS) technology. Silicon-on-insulator (SOI) processes are used to demonstrate the feasibility of the new device, whereas the CMOS-MEMS processes are used to enable the integration of the photo detector and on-chip signal conditioning circuitry. Focused optical spot size measured by the reflection-type SOI device is demonstrated to be close to the diffraction limit. Preliminary measurement results of the CMOS-MEMS device are also presented.
Keywords :
micro-optomechanical devices; optical design techniques; optical fabrication; optical scanners; photodetectors; silicon-on-insulator; CMOS MEMS; SOI; focused optical spot size; laser beam profile; microelectromechanical-system technology silicon-on-insulator process; microknife-edge scanner; on-chip signal conditioning circuitry; optical measurement devices; photodetector; silicon-on-insulator; CMOS process; CMOS technology; Circuit testing; Integrated circuit measurements; Laser beams; Micromechanical devices; Optical beams; Optical device fabrication; Optical devices; Silicon on insulator technology; CMOS MEMS; SOI; diffraction limit; focused optical spot; knife edge;
Conference_Titel :
Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on
Conference_Location :
Hualien
Print_ISBN :
978-1-4244-0641-8
DOI :
10.1109/OMEMS.2007.4373825
