DocumentCode :
1961810
Title :
Nanometer definition of atomic beams with masks of light
Author :
Abfalterer, R. ; Bernet, S. ; Keller, C. ; Oberthaler, M.K. ; Schmiedmayer, J. ; Zeilinger, A.
Author_Institution :
Inst. fur Experimentalphys., Innsbruck Univ., Austria
fYear :
1998
fDate :
8-8 May 1998
Firstpage :
167
Lastpage :
168
Abstract :
Summary form only given.Efficient methods to prepare and measure atomic distributions with nanometer resolution are of particular interest in atom optics and for possible applications in science and technology. A versatile and particularly useful tool is absorptive masks, which can be used both to write and to probe fine structures. We combine the advantages of absorptive masks with the flexibility of light structures. We report the realization of well-defined absorptive masks at nanometer resolution for neutral atoms, which are entirely made of light.
Keywords :
argon; atomic beams; masks; nanotechnology; particle optics; 801 nm; Ar; Ar atoms; absorptive masks; argon atoms; atom optics; atomic beams; atomic distributions; fine structures; light structures; masks; nanometer definition; nanometer resolution; neutral atoms; science; technology; Absorption; Argon; Atom optics; Atomic beams; Atomic measurements; Gratings; Metastasis; Optical scattering; Resonance; Stationary state;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quantum Electronics Conference, 1998. IQEC 98. Technical Digest. Summaries of papers presented at the International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-541-2
Type :
conf
DOI :
10.1109/IQEC.1998.680343
Filename :
680343
Link To Document :
بازگشت