Title :
The collaboration management infrastructure
Author :
Schuster, Hans ; Baker, Donald ; Cichocki, Andrzej ; Georgakopoulos, Dimitrios ; Rusinkiewicz, Marek
Author_Institution :
Microelectron. & Comput. Technol. Corp., Austin, TX, USA
Abstract :
The Collaboration Management lnfrastructure (CMI) has been developed at MCC to manage collaboration processes in both traditional and virtual enterprises, and to provide combined process and situation awareness. CMI technology development is driven by the requirements of many advanced applications provided by the companies that are members of the consortial CMI project. Such advanced applications include crisis mitigation, command and control, logistics, and service provisioning in virtual enterprises. These applications are not effectively supported by existing workflow and groupware technologies. To address the requirements imposed by these applications CMI provides a sophisticated Collaboration Management Model (CMM) and a corresponding component-oriented system that implements the CMM. CMM draws existing primitives from workflow and groupware models and introduces new primitives that address previously unsupported requirements of the CMI driver applications. In this paper, a crisis mitigation application is presented that involves several process templates which are extended dynamically as details about the crisis become known
Keywords :
command and control systems; groupware; logistics data processing; CMI technology development; collaboration management infrastructure; collaboration processes; command and control; component-oriented system; crisis mitigation; groupware models; logistics; process templates; service provisioning; virtual enterprises; Collaboration; Collaborative software; Collaborative work; Coordinate measuring machines; Crisis management; Engines; Process design; Samarium; Virtual enterprises; Workflow management software;
Conference_Titel :
Data Engineering, 2000. Proceedings. 16th International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7695-0506-6
DOI :
10.1109/ICDE.2000.839490