DocumentCode
1962581
Title
The Role of the Quantum-confined Stark Effect in an InGaN/GaN Quantum Well During its Coupling with Surface Plasmon for Light Emission Enhancement
Author
Chen, Cheng-Yen ; Lu, Yen-Cheng ; Yeh, Dong-Ming ; Yang, C.C.
Author_Institution
Graduate Inst. of Electro-Optical Eng., Taipei
fYear
2007
fDate
Aug. 12 2007-July 16 2007
Firstpage
129
Lastpage
130
Abstract
We analyze the contribution of the screening of the quantum-confined Stark effect (QCSE) to the light emission enhancement behavior in the surface plasmon (SP) coupling process with an InGaN/GaN quantum well (QW). From the measurements of excitation power-dependent photoluminescence and time-resolved photoluminescence (TRPL), and the fitting to the TRPL data based on a rate-equation model, it is found that when the excitation level is high, the QCSE screening effect not only contributes significantly to the emission enhancement, but also enforces the SP coupling process because of the blue shift of emission spectrum caused by the screening effect. Therefore, the emission strength from SP radiation, relative to that from QW radiative recombination, increases with the excited carrier density.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; photoluminescence; quantum confined Stark effect; semiconductor quantum wells; surface plasmons; time resolved spectra; wide band gap semiconductors; InGaN-GaN; QCSE screening effect; excitation power; excited carrier density; light emission enhancement; quantum confined Stark effect; radiative recombination; semiconductor quantum well; surface plasmon coupling; time resolved photoluminescence; Electronic mail; Gallium nitride; Laser excitation; Optical coupling; Photoluminescence; Plasmons; Stark effect; Substrates; Surface fitting; Transistors; InGaN/GaN quantum well; quantum-confined Stark effect; surface plasmon; time-resolved photoluminescence;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on
Conference_Location
Hualien
Print_ISBN
978-1-4244-0641-8
Type
conf
DOI
10.1109/OMEMS.2007.4373874
Filename
4373874
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