Title :
The Study on 3D Electron Beam Lithography for Sub-micrometer Diffractive Optics
Author :
Yin, Hung-Lin ; Hu, Joseph Y C ; Yu, Chih-Sheng
Author_Institution :
Instrum. Technol. Res. Center, Hsinchu
fDate :
Aug. 12 2007-July 16 2007
Abstract :
The fabrication technology of gray-scale electron beam lithography for hologram and Fresnel lens with sub-micrometer features has been reported in this paper. Mass-production of these optical elements by integrating with electroforming and hot embossing has also been demonstrated. For a more critical case, such as antireflective structure array, a novel scattering electron beam lithography has been successfully applied on this application.
Keywords :
diffractive optical elements; electroforming; electron beam lithography; embossing; holographic optical elements; microlenses; optical fabrication; 3D electron beam lithography; Fresnel lens; antireflective structure array; electroforming integration; hologram lens; hot embossing; moth eye; optical elements; scattering electron beam lithography; submicrometer diffractive optics; Electron beams; Electron optics; Embossing; Gray-scale; Integrated optics; Lenses; Lithography; Optical device fabrication; Optical diffraction; Optical scattering; Fresnel lens; electron beam lithography; gray-scale; hologram; moth eye;
Conference_Titel :
Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on
Conference_Location :
Hualien
Print_ISBN :
978-1-4244-0641-8
DOI :
10.1109/OMEMS.2007.4373884
