DocumentCode
1962879
Title
Fabrication of a Multi-Level Lens Using Independent-Exposure Lithography and FAB Plasma Etching
Author
Woo, Do Kyun ; Hane, Kazuhiro ; Lee, Cha Bum ; Lee, Sun Kyu
Author_Institution
Gwangju Inst. of Sci. & Technol., Gwangju
fYear
2007
fDate
Aug. 12 2007-July 16 2007
Firstpage
151
Lastpage
152
Abstract
Recently, a micro lens is need for the micro optical system requiring thin thickness. A multi-level lens can be adaptable to satisfy the requirement of this purpose. In this study, an independent-exposure of electron beam lithography and FAB plasma etching method are presented for the fabrication of a multi-level lens. The advantages of the method are the non-repetitive process and the precise fabrication due to the principle of the independent-exposure lithography.
Keywords
electron beam lithography; microlenses; sputter etching; FAB plasma etching; electron beam lithography; independent-exposure lithography; microlens; microoptical system; multilevel lens; nonrepetitive process; Electron beams; Electron optics; Etching; IEL; Lenses; Lithography; Navigation; Optical device fabrication; Plasma applications; Resists; FAB plasma etching; independent-exposure lithography; multi-level lens; non-repetitive process; proximity effect;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on
Conference_Location
Hualien
Print_ISBN
978-1-4244-0641-8
Type
conf
DOI
10.1109/OMEMS.2007.4373885
Filename
4373885
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