Title :
Fabrication of a Multi-Level Lens Using Independent-Exposure Lithography and FAB Plasma Etching
Author :
Woo, Do Kyun ; Hane, Kazuhiro ; Lee, Cha Bum ; Lee, Sun Kyu
Author_Institution :
Gwangju Inst. of Sci. & Technol., Gwangju
fDate :
Aug. 12 2007-July 16 2007
Abstract :
Recently, a micro lens is need for the micro optical system requiring thin thickness. A multi-level lens can be adaptable to satisfy the requirement of this purpose. In this study, an independent-exposure of electron beam lithography and FAB plasma etching method are presented for the fabrication of a multi-level lens. The advantages of the method are the non-repetitive process and the precise fabrication due to the principle of the independent-exposure lithography.
Keywords :
electron beam lithography; microlenses; sputter etching; FAB plasma etching; electron beam lithography; independent-exposure lithography; microlens; microoptical system; multilevel lens; nonrepetitive process; Electron beams; Electron optics; Etching; IEL; Lenses; Lithography; Navigation; Optical device fabrication; Plasma applications; Resists; FAB plasma etching; independent-exposure lithography; multi-level lens; non-repetitive process; proximity effect;
Conference_Titel :
Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on
Conference_Location :
Hualien
Print_ISBN :
978-1-4244-0641-8
DOI :
10.1109/OMEMS.2007.4373885
