Self-Assembled Two-Dimensional Block Copolymers on Pre-patterned Templates with Laser Interference Lithography

Author

Wu, C.Y. ; Huang, Y.F. ; Yang, C.M. ; Lai, N.D. ; Wu, C.H. ; Tsiang, C.C. ; Hsu, C.C.

Author_Institution

Nat. Chung Cheng Univ., Chiayi

fYear

2007

fDate

Aug. 12 2007-July 16 2007

Firstpage

153

Lastpage

154

Abstract

We present an experimental result of the self-assembling for cylindrical nanostructures of PS-b-PMMA block copolymers (BCPs) on pre-patterned templates. The templates are fabricated by two-beam interference lithography at 325 nm into negative SU-8 photoresist. To align the BCPs nanostructures perpendicular the surface of templates, homopolymer polystyrene (hPS) layer is brushed on the patterns for modifying the interfacial energies. Thus, precisely control the localization and orientation of PS-b-PMMA nanostructures on patterned substrates is achieved.

Keywords

laser materials processing; nanolithography; nanopatterning; nanostructured materials; photoresists; polymer blends; self-assembly; surface energy; cylindrical PMMA nanostructures; homopolymer polystyrene layer; interfacial energies; laser interference lithography; negative SU-8 photoresist; pre-patterned templates; self-assembly; two-dimensional block copolymers; Business continuity; Gratings; Interference; Lithography; Nanostructures; Polymers; Resists; Self-assembly; Substrates; Surface topography; diblock copolymers; laser interference lithography; self-assembly;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on

Conference_Location

Hualien

Print_ISBN

978-1-4244-0641-8

Type

conf

DOI

10.1109/OMEMS.2007.4373886

Filename

4373886