Title :
Self-Assembled Two-Dimensional Block Copolymers on Pre-patterned Templates with Laser Interference Lithography
Author :
Wu, C.Y. ; Huang, Y.F. ; Yang, C.M. ; Lai, N.D. ; Wu, C.H. ; Tsiang, C.C. ; Hsu, C.C.
Author_Institution :
Nat. Chung Cheng Univ., Chiayi
fDate :
Aug. 12 2007-July 16 2007
Abstract :
We present an experimental result of the self-assembling for cylindrical nanostructures of PS-b-PMMA block copolymers (BCPs) on pre-patterned templates. The templates are fabricated by two-beam interference lithography at 325 nm into negative SU-8 photoresist. To align the BCPs nanostructures perpendicular the surface of templates, homopolymer polystyrene (hPS) layer is brushed on the patterns for modifying the interfacial energies. Thus, precisely control the localization and orientation of PS-b-PMMA nanostructures on patterned substrates is achieved.
Keywords :
laser materials processing; nanolithography; nanopatterning; nanostructured materials; photoresists; polymer blends; self-assembly; surface energy; cylindrical PMMA nanostructures; homopolymer polystyrene layer; interfacial energies; laser interference lithography; negative SU-8 photoresist; pre-patterned templates; self-assembly; two-dimensional block copolymers; Business continuity; Gratings; Interference; Lithography; Nanostructures; Polymers; Resists; Self-assembly; Substrates; Surface topography; diblock copolymers; laser interference lithography; self-assembly;
Conference_Titel :
Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on
Conference_Location :
Hualien
Print_ISBN :
978-1-4244-0641-8
DOI :
10.1109/OMEMS.2007.4373886
