Fabrication of Wafer-level Antireflective Structures in Optoelectronic Applications

Author

Hsieh, C. Max ; Chyan, J.Y. ; Hsu, Wen-Ching ; Yeh, J. Andrew

Author_Institution

Nat. Tsing Hua Univ., Hsinchu

fYear

2007

fDate

Aug. 12 2007-July 16 2007

Firstpage

185

Lastpage

186

Abstract

Moth-eye structure (MES), biologically antireflective structure, can be regarded as an impedance-matching layer in optics. MES possesses remarkable antireflective effects and plays a big role in optoelectronic applications. The wafer-level MES achieved using chemical etching with metal catalyst has been demonstrated. The method proposed in this paper provided a rapid and simple fabrication and could be integrated with current fabrication of solar cells and light-emitted devices (LED).

Keywords

antireflection coatings; catalysis; etching; light emitting devices; nanotechnology; optical fabrication; solar cells; biologically antireflective structure; chemical etching; impedance-matching layer; light-emitted devices; metal catalyst; moth-eye structure; optoelectronic applications; solar cells; wafer-level antireflective structures; Biomedical optical imaging; Chemicals; Etching; Holographic optical components; Holography; Lithography; Manufacturing; Optical device fabrication; Plasma applications; Reflectivity; antireflective; moth-eye structure (MES); wafer-level;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on

Conference_Location

Hualien

Print_ISBN

978-1-4244-0641-8

Type

conf

DOI

10.1109/OMEMS.2007.4373902

Filename

4373902