Title :
Fabrication of Wafer-level Antireflective Structures in Optoelectronic Applications
Author :
Hsieh, C. Max ; Chyan, J.Y. ; Hsu, Wen-Ching ; Yeh, J. Andrew
Author_Institution :
Nat. Tsing Hua Univ., Hsinchu
fDate :
Aug. 12 2007-July 16 2007
Abstract :
Moth-eye structure (MES), biologically antireflective structure, can be regarded as an impedance-matching layer in optics. MES possesses remarkable antireflective effects and plays a big role in optoelectronic applications. The wafer-level MES achieved using chemical etching with metal catalyst has been demonstrated. The method proposed in this paper provided a rapid and simple fabrication and could be integrated with current fabrication of solar cells and light-emitted devices (LED).
Keywords :
antireflection coatings; catalysis; etching; light emitting devices; nanotechnology; optical fabrication; solar cells; biologically antireflective structure; chemical etching; impedance-matching layer; light-emitted devices; metal catalyst; moth-eye structure; optoelectronic applications; solar cells; wafer-level antireflective structures; Biomedical optical imaging; Chemicals; Etching; Holographic optical components; Holography; Lithography; Manufacturing; Optical device fabrication; Plasma applications; Reflectivity; antireflective; moth-eye structure (MES); wafer-level;
Conference_Titel :
Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on
Conference_Location :
Hualien
Print_ISBN :
978-1-4244-0641-8
DOI :
10.1109/OMEMS.2007.4373902
