DocumentCode :
1963715
Title :
In Situ Surface Characterization by Elastic Light Scattering
Author :
Epler, J.E. ; Schweizer, H.P.
Author_Institution :
Paul Scherrer Institute Zurich
fYear :
1992
fDate :
8-11 Jun 1992
Firstpage :
25
Lastpage :
26
Keywords :
Gallium arsenide; Indium phosphide; Light scattering; MOCVD; Molecular beam epitaxial growth; Monitoring; Particle scattering; Substrates; Surface topography; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Metalorganic Vapor Phase Epitaxy, 1992. Sixth International Conference
Print_ISBN :
0-87942-652-7
Type :
conf
DOI :
10.1109/MOVPE.1992.664917
Filename :
664917
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1963715
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