DocumentCode
1963965
Title
Fabrication of SAW resonators on Quartz and Langasite using Nano-Imprint Lithography
Author
Forsén, Esko ; Nilsson, Daniel ; Daniau, William ; François, Bruno ; Ballandras, Sylvain
Author_Institution
Danish Technolgy Inst., Tech. Univ. of Denmark, Taastrup, Denmark
fYear
2010
fDate
11-14 Oct. 2010
Firstpage
2091
Lastpage
2094
Abstract
The development of new technological approaches such as Nano-Imprint Lithography (NIL) is expected to open new perspectives in the cost-effective high resolution fabrication of SAW devices. Resonators operating near 380 MHz and near 434 MHz have tested respectively on Langasite and Quartz. Q factor in excess of 12000 have been measured on Langasite and frequency distribution within one 4" wafer was found smaller or equal 200 kHz for LGS and smaller than 100 kHz for Quartz. Finger width smaller than 400 nm also have been successfully achieved.
Keywords
nanolithography; surface acoustic wave resonators; SAW resonators; langasite; nanoimprint lithography; quartz; Electrodes; Fabrication; Lithography; Optical resonators; Q factor; Resists; Surface acoustic waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium (IUS), 2010 IEEE
Conference_Location
San Diego, CA
ISSN
1948-5719
Print_ISBN
978-1-4577-0382-9
Type
conf
DOI
10.1109/ULTSYM.2010.5936002
Filename
5936002
Link To Document