• DocumentCode
    1965317
  • Title

    Design and technology interaction beyond 32nm

  • Author

    Clinton, Michael ; Bittlestone, Clive ; Girishankar, G. ; Le, Viet ; Menezes, Vinod

  • Author_Institution
    Texas Instrum., Dallas, TX, USA
  • fYear
    2011
  • fDate
    19-21 Sept. 2011
  • Firstpage
    1
  • Lastpage
    9
  • Abstract
    This paper will discuss the challenges that continued technology scaling present to circuit designers and how the close interaction between the development of technology, design automation (EDA) tools and the circuit designer can overcome these challenges and enable designs that deliver the benefits customers expect from continued technology scaling.
  • Keywords
    semiconductor technology; (EDA) tools; circuit designers; continued technology scaling; design automation tools; size 32 nm; Delay; Layout; Random access memory; Resistance; System-on-a-chip; Transistors; Wires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Custom Integrated Circuits Conference (CICC), 2011 IEEE
  • Conference_Location
    San Jose, CA
  • ISSN
    0886-5930
  • Print_ISBN
    978-1-4577-0222-8
  • Type

    conf

  • DOI
    10.1109/CICC.2011.6055353
  • Filename
    6055353
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1965317