DocumentCode :
1965569
Title :
Scaling of SiGe BiCMOS Technologies for Applications above 100 GHz
Author :
Chevalier, P. ; Lacave, T. ; Canderle, E. ; Pottrain, A. ; Carminati, Y. ; Rosa, J. ; Pourchon, F. ; Derrier, N. ; Avenier, G. ; Montagne, A. ; Balteanu, A. ; Dacquay, E. ; Sarkas, I. ; Celi, D. ; Gloria, D. ; Gaquiere, Christopher ; Voinigescu, S.P. ; Ch
Author_Institution :
STMicroelectron., Crolles, France
fYear :
2012
fDate :
14-17 Oct. 2012
Firstpage :
1
Lastpage :
4
Abstract :
This paper summarizes the technological developments carried out in STMicroelectronics to raise the fT / fMAX of SiGe HBTs up to ~ 300 GHz / 400 GHz. The noise and power performance in the W-band of different SiGe HBT generations are compared along with CML ring oscillators and circuit results up to the D band.
Keywords :
BiCMOS integrated circuits; Ge-Si alloys; bipolar MIMIC; field effect MIMIC; heterojunction bipolar transistors; millimetre wave bipolar transistors; semiconductor materials; submillimetre wave transistors; BiCMOS technology; CML ring oscillators; D band; HBT generations; STMicroelectronics; SiGe; W-band; noise performance; power performance; BiCMOS integrated circuits; Frequency measurement; Heterojunction bipolar transistors; Noise measurement; Ring oscillators; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2012 IEEE
Conference_Location :
La Jolla, CA
ISSN :
1550-8781
Print_ISBN :
978-1-4673-0928-8
Type :
conf
DOI :
10.1109/CSICS.2012.6340083
Filename :
6340083
Link To Document :
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