DocumentCode :
1965877
Title :
Adaptability of a 280 GHz SiGe BiCMOS Process for High Frequency Commercial Applications
Author :
Preisler, E. ; Zheng, J. ; Chaudhry, S. ; Yan, Z. ; Booth, R. ; Qamar, M. ; Racanelli, M.
Author_Institution :
TowerJazz, Newport Beach, CA, USA
fYear :
2012
fDate :
14-17 Oct. 2012
Firstpage :
1
Lastpage :
4
Abstract :
SiGe HBT devices with FMAX up to 500 GHz have been reported in the past few years [1], suggesting the realization of practical circuits into the THz regime. While the bulk of commercial applications will operate at much lower frequencies, the high level of RF performance realized by these devices can be leveraged to enable better circuit designs at these lower frequencies. In this paper several aspects of this optimization will be discussed including operation at both low and high VCC, low IC, and high temperatures. Finally a fully integrated varactor suitable for mm-Wave frequency synthesis will be discussed.
Keywords :
BiCMOS integrated circuits; Ge-Si alloys; bipolar MMIC; heterojunction bipolar transistors; optimisation; varactors; SiGe; SiGe BiCMOS process; SiGe HBT devices; THz regime; circuit designs; frequency 280 GHz; fully integrated varactor; high frequency commercial applications; mm-wave frequency synthesis; optimization; BiCMOS integrated circuits; Degradation; Heterojunction bipolar transistors; Performance evaluation; Radio frequency; Silicon germanium; Varactors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2012 IEEE
Conference_Location :
La Jolla, CA
ISSN :
1550-8781
Print_ISBN :
978-1-4673-0928-8
Type :
conf
DOI :
10.1109/CSICS.2012.6340098
Filename :
6340098
Link To Document :
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