• DocumentCode
    1965877
  • Title

    Adaptability of a 280 GHz SiGe BiCMOS Process for High Frequency Commercial Applications

  • Author

    Preisler, E. ; Zheng, J. ; Chaudhry, S. ; Yan, Z. ; Booth, R. ; Qamar, M. ; Racanelli, M.

  • Author_Institution
    TowerJazz, Newport Beach, CA, USA
  • fYear
    2012
  • fDate
    14-17 Oct. 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    SiGe HBT devices with FMAX up to 500 GHz have been reported in the past few years [1], suggesting the realization of practical circuits into the THz regime. While the bulk of commercial applications will operate at much lower frequencies, the high level of RF performance realized by these devices can be leveraged to enable better circuit designs at these lower frequencies. In this paper several aspects of this optimization will be discussed including operation at both low and high VCC, low IC, and high temperatures. Finally a fully integrated varactor suitable for mm-Wave frequency synthesis will be discussed.
  • Keywords
    BiCMOS integrated circuits; Ge-Si alloys; bipolar MMIC; heterojunction bipolar transistors; optimisation; varactors; SiGe; SiGe BiCMOS process; SiGe HBT devices; THz regime; circuit designs; frequency 280 GHz; fully integrated varactor; high frequency commercial applications; mm-wave frequency synthesis; optimization; BiCMOS integrated circuits; Degradation; Heterojunction bipolar transistors; Performance evaluation; Radio frequency; Silicon germanium; Varactors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductor Integrated Circuit Symposium (CSICS), 2012 IEEE
  • Conference_Location
    La Jolla, CA
  • ISSN
    1550-8781
  • Print_ISBN
    978-1-4673-0928-8
  • Type

    conf

  • DOI
    10.1109/CSICS.2012.6340098
  • Filename
    6340098