DocumentCode
1966161
Title
Nonvolatile RAM based on magnetic tunnel junction elements
Author
Durlam, M. ; Naji, P. ; DeHerrera, M. ; Tehrani, S. ; Kerszykowski, G. ; Kyler, K.
Author_Institution
Phys. Sci. Res. Labs., Motorola Labs., Tempe, AZ, USA
fYear
2000
fDate
9-9 Feb. 2000
Firstpage
130
Lastpage
131
Abstract
Magnetoresistive random access memory (MRAM), is based on magnetic memory elements integrated with CMOS. Key attributes of MRAM technology are nonvolatility and unlimited read and write endurance. Recent advances in magnetic tunnel junction (MTJ) materials give MRAM the potential for high speed, low operating voltage, and high density.
Keywords
magnetic film stores; magnetoresistive devices; random-access storage; CMOS; density; magnetic memory elements; magnetic tunnel junction elements; magnetoresistive random access memory; nonvolatile RAM; operating voltage; read endurance; speed; write endurance; Contracts; Magnetic switching; Magnetic tunneling; Magnetoresistance; Memory architecture; Nonvolatile memory; Read-write memory; Solid state circuits; Switching circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference, 2000. Digest of Technical Papers. ISSCC. 2000 IEEE International
Conference_Location
San Francisco, CA, USA
ISSN
0193-6530
Print_ISBN
0-7803-5853-8
Type
conf
DOI
10.1109/ISSCC.2000.839718
Filename
839718
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