DocumentCode :
1966603
Title :
Characterization of mid-gap states in n-type GaN with optical-isothermal capacitance transient spectroscopy
Author :
Hacke, P. ; Okushi, H.
Author_Institution :
Electrotech. Lab., Ibaraki, Japan
fYear :
1997
fDate :
11-13 Aug. 1997
Firstpage :
45
Lastpage :
46
Abstract :
In this work, the deep level band structure of unintentionally doped n-type GaN grown by HVPE and MOVPE is demonstrated. Optical-isothermal capacitance transient spectroscopy (O-ICTS) is used to simultaneously observe thermal and optical emission processes from deep levels. The key benefit of this technique found when applied to GaN is that deep levels can be distinguished spectroscopically by their characteristic emission time constant. The O-ICTS spectra can be deconvoluted to estimate the concentrations and ionization energies of deep levels with a high degree of confidence.
Keywords :
III-V semiconductors; deep level transient spectroscopy; gallium compounds; photoluminescence; GaN; HVPE; MOVPE; O-ICTS; deep level band structure; ionization energy; mid-gap states; n-type GaN; optical emission; optical-isothermal capacitance transient spectroscopy; thermal emission; time constant; Capacitance; Gallium nitride; Impurities; Ionization; Laboratories; Optical devices; Photoluminescence; Semiconductor devices; Spectroscopy; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vertical-Cavity Lasers, Technologies for a Global Information Infrastructure, WDM Components Technology, Advanced Semiconductor Lasers and Applications, Gallium Nitride Materials, Processing, and Devi
Conference_Location :
Montreal, Que., Canada
Print_ISBN :
0-7803-3891-X
Type :
conf
DOI :
10.1109/LEOSST.1997.619255
Filename :
619255
Link To Document :
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