• DocumentCode
    1966603
  • Title

    Characterization of mid-gap states in n-type GaN with optical-isothermal capacitance transient spectroscopy

  • Author

    Hacke, P. ; Okushi, H.

  • Author_Institution
    Electrotech. Lab., Ibaraki, Japan
  • fYear
    1997
  • fDate
    11-13 Aug. 1997
  • Firstpage
    45
  • Lastpage
    46
  • Abstract
    In this work, the deep level band structure of unintentionally doped n-type GaN grown by HVPE and MOVPE is demonstrated. Optical-isothermal capacitance transient spectroscopy (O-ICTS) is used to simultaneously observe thermal and optical emission processes from deep levels. The key benefit of this technique found when applied to GaN is that deep levels can be distinguished spectroscopically by their characteristic emission time constant. The O-ICTS spectra can be deconvoluted to estimate the concentrations and ionization energies of deep levels with a high degree of confidence.
  • Keywords
    III-V semiconductors; deep level transient spectroscopy; gallium compounds; photoluminescence; GaN; HVPE; MOVPE; O-ICTS; deep level band structure; ionization energy; mid-gap states; n-type GaN; optical emission; optical-isothermal capacitance transient spectroscopy; thermal emission; time constant; Capacitance; Gallium nitride; Impurities; Ionization; Laboratories; Optical devices; Photoluminescence; Semiconductor devices; Spectroscopy; Stimulated emission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vertical-Cavity Lasers, Technologies for a Global Information Infrastructure, WDM Components Technology, Advanced Semiconductor Lasers and Applications, Gallium Nitride Materials, Processing, and Devi
  • Conference_Location
    Montreal, Que., Canada
  • Print_ISBN
    0-7803-3891-X
  • Type

    conf

  • DOI
    10.1109/LEOSST.1997.619255
  • Filename
    619255