DocumentCode
1966718
Title
Femtosecond laser micromachining of sapphire
Author
Kim, K.-S. ; Jones, D. ; Bente, E. ; Girkin, J.M. ; Dawson, M.D.
Author_Institution
Inst. of Photonics, Strathclyde Univ., Glasgow, UK
Volume
2
fYear
2001
fDate
2001
Firstpage
762
Abstract
50 fs pulse laser micromachining of sapphire has been demonstrated. The smooth and clean features and high ablation rate have proven the suitability of this technique for micro-scale machining of this technologically important material
Keywords
high-speed optical techniques; laser ablation; laser beam machining; micromachining; sapphire; substrates; Al2O3; III-nitride device substrate; air breakdown effect; deep grooves; femtosecond laser micromachining; flat bottom surfaces; gratings; high-aspect-ratio grooves; laser ablation; narrow grooves; sapphire; single-side-polished wafers; trenches; Chemical lasers; Laser ablation; Laser beams; Laser mode locking; Machining; Micromachining; Optical pulses; Power generation; Power lasers; Ultrafast optics;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE
Conference_Location
San Diego, CA
ISSN
1092-8081
Print_ISBN
0-7803-7105-4
Type
conf
DOI
10.1109/LEOS.2001.969038
Filename
969038
Link To Document