DocumentCode :
1966718
Title :
Femtosecond laser micromachining of sapphire
Author :
Kim, K.-S. ; Jones, D. ; Bente, E. ; Girkin, J.M. ; Dawson, M.D.
Author_Institution :
Inst. of Photonics, Strathclyde Univ., Glasgow, UK
Volume :
2
fYear :
2001
fDate :
2001
Firstpage :
762
Abstract :
50 fs pulse laser micromachining of sapphire has been demonstrated. The smooth and clean features and high ablation rate have proven the suitability of this technique for micro-scale machining of this technologically important material
Keywords :
high-speed optical techniques; laser ablation; laser beam machining; micromachining; sapphire; substrates; Al2O3; III-nitride device substrate; air breakdown effect; deep grooves; femtosecond laser micromachining; flat bottom surfaces; gratings; high-aspect-ratio grooves; laser ablation; narrow grooves; sapphire; single-side-polished wafers; trenches; Chemical lasers; Laser ablation; Laser beams; Laser mode locking; Machining; Micromachining; Optical pulses; Power generation; Power lasers; Ultrafast optics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE
Conference_Location :
San Diego, CA
ISSN :
1092-8081
Print_ISBN :
0-7803-7105-4
Type :
conf
DOI :
10.1109/LEOS.2001.969038
Filename :
969038
Link To Document :
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