Title :
Bias-dependent dual-spectral InAs/In/sub 0.15/Ga/sub 0.85/As quantum dot infrared photodetectors
Author :
Zhengmao Ye ; Campbell, Joe C.
Author_Institution :
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
Abstract :
InAs/InGaAs quantum dots infiared photodetectors (QDIPs) were studied. We report an InAs/In0.15Ga0.85As QDIP with bias-dependent multispectral characteristics. The QDIP sample was grown on a semi-insulating GaAs(001) substrate by solid-source molecular beam epitaxy (MBE). This QDIP sample consisted of five stacks of InAs pyramidal QDs capped by InGaAs and sandwiched between heavily-doped GaAs layers. By introducing In into the GaAs cap layers, we could change the intersubband transition in the QDs. Fourier transformation infrared spectroscopy measurement showed a peak photoresponse at the wavelength of ~5.6μm for a bias of -0.5V. At the bias of -0.8V, a photoresponse at the wavelength of ~9.lμm could be observed; the magnitude of photoresponse was comparable to that of the ~5.6μm peak. With further increment of the bias the photoresponse at ~9.lμm dominated the spectrum. The spectrum also indicated that the photoresponse was due to a band-to-band intersubband transition in the InAs QDs.
Keywords :
Fourier transform spectra; III-V semiconductors; gallium arsenide; indium compounds; infrared detectors; infrared spectra; photodetectors; quantum well devices; semiconductor device noise; semiconductor quantum dots; FTIR spectra; InAs-In/sub 0.15/Ga/sub 0.85/As; InAs-InGaAs; bias-dependent dual-spectral characteristics; blackbody source; current noise; dark current; heavily doped layers; higher photoresponse; peak photoresponse; pyramidal quantum dots; quantum dot infrared photodetectors; solid-source molecular beam epitaxy; Current measurement; Dark current; Density measurement; Noise figure; Noise measurement; Photodetectors; Quantum dots; Temperature measurement; Wavelength measurement;
Conference_Titel :
Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-7105-4
DOI :
10.1109/LEOS.2001.969040