• DocumentCode
    1966987
  • Title

    Superlattice structures for nanocrystalline silicon solar cells

  • Author

    Madhavan, Atul ; Dalal, Vikram L. ; Noack, Max A.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Iowa State Univ., Ames, IA
  • fYear
    2008
  • fDate
    18-20 May 2008
  • Firstpage
    383
  • Lastpage
    388
  • Abstract
    We propose two new techniques for enhancing the performance of nanocrystalline silicon solar cells. The first technique involves the use of superlattice structures of amorphous and nanocrystalline silicon layers. We show that the thickness of the amorphous layer is critical in determining the transport properties of the device and that the optimum thickness varies with the nanocrystalline silicon layer thickness. The second design involves the use of high growth temperatures to enhance the grain size. We show that by increasing the grain size, we can attain good device properties, if the intrinsic layer is subjected to post deposition hydrogen anneal while rapidly cooling down. Also we are able to obtain an enhanced response in the infrared quantum efficiency.
  • Keywords
    elemental semiconductors; nanostructured materials; silicon; solar cells; Si; grain size; infrared quantum efficiency; nanocrystalline silicon solar cells; optimum thickness; superlattice structures; Amorphous materials; Annealing; Grain size; Hydrogen; Nanoscale devices; Nanostructures; Photovoltaic cells; Silicon; Superlattices; Temperature; Deposition techniques; nanocrystalline silicon; solar cells; superlattices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electro/Information Technology, 2008. EIT 2008. IEEE International Conference on
  • Conference_Location
    Ames, IA
  • Print_ISBN
    978-1-4244-2029-2
  • Electronic_ISBN
    978-1-4244-2030-8
  • Type

    conf

  • DOI
    10.1109/EIT.2008.4554333
  • Filename
    4554333