Title :
Silicon double-island single-electron device
Author :
Fujiwara, A. ; Takahashi, Y. ; Yamazaki, K. ; Namatsu, H. ; Nagase, M. ; Kurihara, K. ; Murase, K.
Author_Institution :
NTT Basic Res. Labs., Kanagawa, Japan
Abstract :
A three-current-terminal single-electron device including two capacitively-coupled Si islands and gates that can control each island was fabricated on a Si-on-insulator wafer. Each island was embedded in one branch of a T-shaped Si wire. Current switching between the two branches was performed at 30 K by using the gate voltage to control the Coulomb blockade at each island. A correlation between these two currents was also found, which opens up the possibility of one-by-one transfer of electrons in this device.
Keywords :
SIMOX; cryogenic electronics; elemental semiconductors; equivalent circuits; logic gates; quantum interference devices; semiconductor quantum wires; semiconductor switches; silicon; 30 K; Coulomb blockade control; SOI wafer; Si; Si-on-insulator wafer; T-shaped Si wire; capacitively-coupled Si islands; current switching; double layer gate structure; double-island single-electron device; gate voltage; three-current-terminal device; Atomic force microscopy; Atomic measurements; Binary decision diagrams; Circuits; Force measurement; Oxidation; Silicon; Single electron devices; Switches; Wire;
Conference_Titel :
Electron Devices Meeting, 1997. IEDM '97. Technical Digest., International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-4100-7
DOI :
10.1109/IEDM.1997.650293