Surface resistivity tailoring of ceramic accelerator components

Author

Anders, S. ; Anders, A. ; Brown, I.

Author_Institution

Lawrence Berkeley Lab., CA, USA

fYear

1993

fDate

17-20 May 1993

Firstpage

1390

Abstract

Metal plasma deposition and metal ion implantation techniques have been developed that could provide a good tool for the surface modification of insulating materials for accelerator applications such as ceramics and that could provide a method for tailoring the surface resistivity over a range of many orders of magnitude. The methods make use of the metal plasma that is produced by the cathodic arc discharge; the plasma itself can be deposited onto the surface at an energy of the order of 100 eV so as to form an adherent thin film, or an energetic metal ion beam can be formed for deep implantation of the metal species below the surface so as to incorporate a controllable amount of metal into the ceramic

Keywords

ceramics; electrical conductivity of crystalline semiconductors and insulators; insulators; ion implantation; particle accelerator accessories; particle accelerators; plasma deposition; surface conductivity; 100 eV; accelerator components; cathodic arc discharge; ceramic; insulating materials; metal ion implantation; metal plasma deposition; surface resistivity; Ceramics; Conductivity; Insulation; Ion accelerators; Ion implantation; Plasma accelerators; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Surface discharges;

fLanguage

English

Publisher

ieee

Conference_Titel

Particle Accelerator Conference, 1993., Proceedings of the 1993

Conference_Location

Washington, DC

Print_ISBN

0-7803-1203-1

Type

conf

DOI

10.1109/PAC.1993.309050

Filename

309050