Title :
Low Loss Implanted Waveguides in Fused Silica
Author_Institution :
Centre National d´´Etudes des Télécommunications. 22301 LANNION (FRANCE)
Abstract :
With prism film coupler, we have studied the major contribution of nuclear process in index change and the influence of ion species, for low-loss waveguides.
Keywords :
Annealing; Optical attenuators; Optical films; Optical losses; Optical refraction; Optical variables control; Optical waveguides; Particle beam optics; Refractive index; Silicon compounds;
Conference_Titel :
Microwave Conference, 1976. 6th European
Conference_Location :
Rome, Italy
DOI :
10.1109/EUMA.1976.332327
