DocumentCode
1968790
Title
Silicon-on-insulator Bragg gratings fabricated by deep UV lithography
Author
Wang, Xu ; Shi, Wei ; Vafaei, Raha ; Jaeger, Nicolas A F ; Chrostowski, Lukas
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of British Columbia, Vancouver, BC, Canada
fYear
2010
fDate
8-12 Dec. 2010
Firstpage
501
Lastpage
502
Abstract
We demonstrate the design and performance of Bragg gratings on silicon-on-insulator waveguides. Two structures for achieving the modulation of the effective index of refraction are described. The grating fabrication is based on deep ultra-violet lithography using a single mask. The thermal tunability of the devices is demonstrated.
Keywords
Bragg gratings; integrated optics; optical fabrication; optical tuning; optical waveguides; refractive index; silicon-on-insulator; ultraviolet lithography; Bragg gratings; deep ultraviolet lithography; refraction index; silicon-on-insulator waveguides; thermal tunability; Bandwidth; Bragg gratings; Corrugated surfaces; Fabrication; Lithography; Strips; Surface waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Communications and Photonics Conference and Exhibition (ACP), 2010 Asia
Conference_Location
Shanghai
Print_ISBN
978-1-4244-7111-9
Type
conf
DOI
10.1109/ACP.2010.5682598
Filename
5682598
Link To Document