Title :
TPA-based distance measurement using high-speed frequency scanner
Author :
Tanaka, Yosuke ; Endo, Naofumi ; Kurokawa, Takashi
Author_Institution :
Grad. Sch. of Eng., Tokyo Univ. of Agric. & Technol., Koganei, Japan
Abstract :
The measurement speed for distance meter using two-photon absorption process in a Si-APD was extremely improved by high-speed frequency scanner based on voltage controlled oscillator. We measured the length of 40 m within 7.5 seconds.
Keywords :
avalanche photodiodes; distance measurement; elemental semiconductors; length measurement; optical scanners; silicon; two-photon processes; voltage-controlled oscillators; Si; Si-APD; TPA-based distance measurement; high-speed frequency scanner; size 40 m; two-photon absorption process; voltage controlled oscillator; Absorption; Amplitude modulation; Distance measurement; Frequency measurement; Frequency modulation; Length measurement; Optical modulation; Probes; Time measurement; Voltage-controlled oscillators; distance measurement; optical sensing; two photon absorption;
Conference_Titel :
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-3829-7
Electronic_ISBN :
978-1-4244-3830-3
DOI :
10.1109/CLEOPR.2009.5292077
