DocumentCode
1969748
Title
High brightness 810 nm long cavity diode lasers with high d/Γ ratio in asymmetric low confinement epitaxial structure
Author
Petrescu-Prahova, Iulian ; Moritz, Tom ; Riordan, John
Author_Institution
High Power Devices, North Brunswick, NJ, USA
Volume
1
fYear
2001
fDate
2001
Firstpage
135
Abstract
It is the aim of this report to show that asymmetric structures with high d/Γ value can be manufactured and reliably operate. A series of epitaxial structures were designed and grown in the AlGaAs system. They all have a 7 nm QW designed for 810 nm emission. A graded confinement layer surrounds the QW. The asymmetric structures have an optical trap on the n side of the QW where another maximum of the radiation field distribution is trapped. The optical trap increases the extension of the radiation field existing outside of the QW and decreases the confinement factor. A second method to decrease the confinement factor is to use a p cladding layer with an increasing (stepwise) AlAs composition index, higher toward the p contact
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; laser reliability; quantum well lasers; semiconductor quantum wells; 7 nm; 810 nm; AlGaAs; AlGaAs system; QW; asymmetric low confinement epitaxial structure; graded confinement layer; high brightness long cavity diode lasers; high d/Γ ratio; optical trap; p cladding layer; radiation field distribution; reliability; stepwise AlAs composition index; Airports; Attenuation; Brightness; Charge carrier processes; Current density; Degradation; Diode lasers; Optical attenuators; Stimulated emission; Threshold current;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE
Conference_Location
San Diego, CA
ISSN
1092-8081
Print_ISBN
0-7803-7105-4
Type
conf
DOI
10.1109/LEOS.2001.969209
Filename
969209
Link To Document