Title :
Stay away from minimum design-rule values [DFM in ultra-deep submicron processes]
Author :
Strolenberg, Chris W H
Author_Institution :
Sagantec Netherlands, Netherlands
Abstract :
The use of non-minimum design-rule values will be an important aspect of design for manufacturability in future ultra-deep submicron (UDSM) processes. EDA tools can and must assist in realizing appropriate design flows. Wire spreading and layout compaction tools are available today to implement preferred design-rule values on mask-layouts for enhanced manufacturability. The area of verification for manufacturability needs to be explored in the near future
Keywords :
ULSI; design for manufacture; integrated circuit design; integrated circuit layout; integrated circuit manufacture; network routing; EDA tools; UDSM process; ULSI; design for manufacturability; layout compaction tools; manufacturability enhancement; mask layouts; nonminimum design-rule values; ultra-deep submicron processes; verification for manufacturability; wire spreading tools; CMOS process; CMOS technology; Circuits; Electronic design automation and methodology; Foundries; Manuals; Manufacturing processes; Routing; Silicon; Wire;
Conference_Titel :
Design, Automation and Test in Europe Conference and Exhibition 2000. Proceedings
Conference_Location :
Paris
Print_ISBN :
0-7695-0537-6
DOI :
10.1109/DATE.2000.840019
