Title :
The study of wavelength interval between adjacent ONUs in OFDMA-PON
Author :
Xie, Xiaoting ; Qiao, Yaojun ; Ji, Yuefeng
Author_Institution :
Key Lab. of Inf. Photonics & Opt. Commun., Beijing Univ. of Posts & Telecommun., Beijing, China
Abstract :
We study the influence of wavelength interval between adjacent ONUs in OFDMA-PON by simulation and theoretical analysis, and find the minimum wavelength intervals which are different in ideal and actual system. The ideal minimum wavelength interval is twice of OFDM symbol bandwidth, while actual minimum interval is larger than that.
Keywords :
OFDM modulation; passive optical networks; OFDM symbol bandwidth; OFDMA-PON; adjacent ONU; minimum wavelength intervals; optical network units; orthogonal frequency division multiple access; passive optical networks; Bandwidth; OFDM; Optical filters; Optical mixing; Optical network units; Optical receivers; Passive optical networks;
Conference_Titel :
Communications and Photonics Conference and Exhibition (ACP), 2010 Asia
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-7111-9
DOI :
10.1109/ACP.2010.5682657
