DocumentCode
1970025
Title
Beyond the Conventional MOSFET
Author
Wong, H. S Philip
Author_Institution
IBM T. J. Watson Research Center, USA
fYear
2001
fDate
11-13 September 2001
Firstpage
69
Lastpage
72
Keywords
CMOS technology; Dielectric materials; Double-gate FETs; Germanium silicon alloys; High K dielectric materials; Inorganic materials; MOSFET circuits; Nanoscale devices; Semiconductor materials; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN
2-914601-01-8
Type
conf
DOI
10.1109/ESSDERC.2001.195206
Filename
1506588
Link To Document