DocumentCode :
1970074
Title :
Joule heating and phonon transport in nanoscale silicon MOSFETs
Author :
Aksamija, Zlatan ; Ravaioli, Umberto
Author_Institution :
Beckman Institute, University of Illinois, 405 N. Mathews, 61801 Urbana, USA
fYear :
2007
fDate :
17-20 May 2007
Firstpage :
70
Lastpage :
72
Abstract :
This work examines the generation of heat in silicon MOSFETs using self-consistent Monte Carlo device simulation with full electron bandstructure and a full phonon dispersion computed from the Adiabatic Bond Charge model. We devise an efficient algorithm for the inclusion of full phonon dispersion in order to account for anisotropy and details of heat transport with great accuracy. We compute the density-of-states (DOS) and the lattice thermal energy numerically and use them to generate maps of local temperatures in a representative small-channel MOSFET device. Our results show that most heat is dissipated in the form of optical g-type phonons in a small region in the drain, and that the heat flows in a preferred direction aligned with the flow of the electron current. We also show that the distribution of generated phonons in energy closely follows the phonon DOS.
Keywords :
MOSFET; Monte Carlo methods; electronic density of states; nanotechnology; Adiabatic Bond Charge model; DOS; Joule heating; Monte Carlo device simulation; density-of-states; electron current flow; nanoscale silicon MOSFET; phonon dispersion; phonon transport; Anisotropic magnetoresistance; Bonding; Computational modeling; Electrons; Heating; Image motion analysis; MOSFETs; Monte Carlo methods; Phonons; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electro/Information Technology, 2007 IEEE International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
978-1-4244-0941-9
Electronic_ISBN :
978-1-4244-0941-9
Type :
conf
DOI :
10.1109/EIT.2007.4374433
Filename :
4374433
Link To Document :
بازگشت