Multiple Gate Oxide Technology Using Fluorine Implantation

Author

Woerlee, P.H. ; Knitel, M.J. ; Meyssen, V.M.H. ; Velghe, R.M.D.A. ; Van Duijnhoven, A. T A Zegers

Author_Institution

Philips Research Laboratories, Eindhoven, The Netherlands

fYear

2001

fDate

11-13 September 2001

Firstpage

107

Lastpage

110

Keywords

CMOS process; CMOS technology; Circuits; Degradation; Diodes; Implants; Laboratories; Leakage current; Nitrogen; Oxidation;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2001. Proceeding of the 31st European

Print_ISBN

2-914601-01-8

Type

DOI

10.1109/ESSDERC.2001.195212

Filename

1506594

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