Title :
Multiple Gate Oxide Technology Using Fluorine Implantation
Author :
Woerlee, P.H. ; Knitel, M.J. ; Meyssen, V.M.H. ; Velghe, R.M.D.A. ; Van Duijnhoven, A. T A Zegers
Author_Institution :
Philips Research Laboratories, Eindhoven, The Netherlands
fDate :
11-13 September 2001
Keywords :
CMOS process; CMOS technology; Circuits; Degradation; Diodes; Implants; Laboratories; Leakage current; Nitrogen; Oxidation;
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
DOI :
10.1109/ESSDERC.2001.195212
