DocumentCode :
1970666
Title :
Advanced Source/Drain Architecture using Very Low Schottky Barriers: Device Design and Material Engineering
Author :
Dubois, Emmanuel ; Larrieu, Guilhem
Author_Institution :
IEMN/ISEN, Villeneuve d´´Ascq, France
fYear :
2001
fDate :
11-13 September 2001
Firstpage :
203
Lastpage :
206
Keywords :
Conductivity; Contact resistance; Design engineering; Doping; Fluctuations; MOSFET circuits; Schottky barriers; Silicides; Silicon; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
Type :
conf
DOI :
10.1109/ESSDERC.2001.195236
Filename :
1506618
Link To Document :
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