Experimental and Numerical Study of Shallow Trench Isolation Processes

Author

Erlebach, A. ; Yun, C.S. ; Matveev, D. ; Mickevicius, R. ; Nouri, F. ; Golnas, A. ; Zelenka, S. ; Fichtner, W.

Author_Institution

Integrated Systems Engineering, Zurich, Switzerland

fYear

2001

fDate

11-13 September 2001

Firstpage

223

Lastpage

226

Keywords

CMOS technology; Isolation technology; Laboratories; MOSFETs; Modeling; Oxidation; Shape; Stress; Systems engineering and theory; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2001. Proceeding of the 31st European

Print_ISBN

2-914601-01-8

Type

DOI

10.1109/ESSDERC.2001.195241

Filename

1506623

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