• DocumentCode
    1971663
  • Title

    Sacrificial spacer technology for suppressed reverse narrow channel effects with shallow trench isolation

  • Author

    Lunenborg, M. ; De Coster, W. ; Guelen, J. ; Inard, A.

  • Author_Institution
    Philips Semiconductors, Crolles, France
  • fYear
    2001
  • fDate
    11-13 September 2001
  • Firstpage
    423
  • Lastpage
    426
  • Keywords
    Atomic force microscopy; CMOS technology; Etching; Fabrication; Implants; Isolation technology; MOS devices; Scanning electron microscopy; Space technology; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2001. Proceeding of the 31st European
  • Print_ISBN
    2-914601-01-8
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2001.195291
  • Filename
    1506673
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1971663