Pockets and offset spacer engineering for 100 nm CMOS

Author

Surdeanu, R. ; Dachs, C.J.J. ; Stolk, P.A. ; Cubaynes, F.N. ; Ponomarev, Y.V.

Author_Institution

Philips Research, Leuven, Belgium

fYear

2001

fDate

11-13 September 2001

Firstpage

431

Lastpage

434

Keywords

Annealing; Boron; CMOS process; CMOS technology; Doping; Implants; Impurities; MOSFETs; Medical simulation; Space technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2001. Proceeding of the 31st European

Print_ISBN

2-914601-01-8

Type

DOI

10.1109/ESSDERC.2001.195293

Filename

1506675

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