Title :
Pockets and offset spacer engineering for 100 nm CMOS
Author :
Surdeanu, R. ; Dachs, C.J.J. ; Stolk, P.A. ; Cubaynes, F.N. ; Ponomarev, Y.V.
Author_Institution :
Philips Research, Leuven, Belgium
fDate :
11-13 September 2001
Keywords :
Annealing; Boron; CMOS process; CMOS technology; Doping; Implants; Impurities; MOSFETs; Medical simulation; Space technology;
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
DOI :
10.1109/ESSDERC.2001.195293
