Investigation of pMOSFET Hot Electron Induced Punch Through (HEIP) in Shallow Trench Isolation

Author

Lee, Jae-kyu ; Lee, Sang-Hyeon ; Jeong, G.T. ; Chung, T.Y. ; Kim, Kinam

Author_Institution

Samsung Electronic Co., Yongin City, Korea

fYear

2001

fDate

11-13 September 2001

Firstpage

467

Lastpage

470

Keywords

Electrons; MOSFET circuits;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2001. Proceeding of the 31st European

Print_ISBN

2-914601-01-8

Type

DOI

10.1109/ESSDERC.2001.195302

Filename

1506684

Link To Document