• DocumentCode
    1972255
  • Title

    Device degradation models for circuit reliability simulation

  • Author

    Sasse, Guido

  • Author_Institution
    NXP Semiconductors Gertstweg 2, Nijmegen, 6534AE, The Neitherlands
  • fYear
    2013
  • fDate
    13-17 Oct. 2013
  • Firstpage
    42
  • Lastpage
    42
  • Abstract
    With reliability margins shrinking, it is increasingly important to carefully assess the impact of device degradation during circuit design. Circuit reliability simulation is a very useful tool for this purpose as it allows designers to guarantee that circuits are sufficiently robust against device degradation, while they are not bound by overly robust design rules. Hence its usage is becoming more and more widely adopted in mixed signal circuit design. Various degradation mechanisms can be evaluated using circuit reliability simulation including hot carrier degradation, NBTI, PBTI as well as TDDB. In this paper I will present the underlying models that are available to describe device degradation as a function of stress conditions. I will explain the methodology used for translating DC degradation models to the time varying stress signals encountered in actual circuits as well as the justification and the limitations of adopting this approach. I will discuss standard CMOS as well as bipolar and DMOS transistors.
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report (IRW), 2013 IEEE International
  • Conference_Location
    South Lake Tahoe, CA, USA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4799-0350-4
  • Type

    conf

  • DOI
    10.1109/IIRW.2013.6804152
  • Filename
    6804152