DocumentCode :
1972340
Title :
Nano- and micromachining of transparent materials using laser plasma soft X-rays
Author :
Makimura, Tetsuya ; Torii, Shuichi ; Niino, Hiroyuki ; Murakami, Kouichi
Author_Institution :
Inst. of Appl. Phys., Univ. of Tsukuba, Tsukuba, Japan
fYear :
2009
fDate :
30-3 Aug. 2009
Firstpage :
1
Lastpage :
2
Abstract :
Laser plasma soft X-rays were applied to fabricate nano- and microstructures on surfaces of transparent materials. The optimized X-ray optics and nano-ablation process of silica glass will be emphasized as key device and process.
Keywords :
X-ray effects; X-ray optics; glass; laser ablation; laser beam machining; micromachining; nanofabrication; plasma materials processing; silicon compounds; transparency; SiO2; X-ray optics; laser plasma soft X-rays; micromachining; nanoablation process; nanomachining; silica glass; transparent material surface; Micromachining; Microstructure; Nanoscale devices; Optical devices; Optical materials; Plasma devices; Plasma materials processing; Plasma x-ray sources; Surface emitting lasers; X-ray lasers; laser plasma soft X-ray; micromachining; nanomachining; silica glass; transparent meterials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-3829-7
Electronic_ISBN :
978-1-4244-3830-3
Type :
conf
DOI :
10.1109/CLEOPR.2009.5292237
Filename :
5292237
Link To Document :
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