Title :
Aberration measurement of lithographic projection lens by using a translational symmetry Alt-PSM grating mark
Author :
Qiu, Zicheng ; Wang, Xiangzhao ; Bi, Qunyu ; Yuan, Qiongyan ; Peng, Bo ; Duan, Lifeng
Author_Institution :
Shanghai Inst. of Opt. & Fine Mech., Chinese Acad. of Sci., Shanghai, China
Abstract :
A method to design a mark with high sensitivity is proved and declared. A translational symmetry Alt-PSM grating mark is redesigned with all of the even orders, plusmn3rd and plusmn5th orders diffraction light missing.
Keywords :
aberrations; diffraction gratings; lenses; photolithography; aberration measurement; diffraction gratings; lithographic projection lens; photolithography; translational symmetry Alt-PSM grating mark; Design methodology; Diffraction gratings; Interference; Lenses; Lighting; Lithography; Mechanical variables measurement; Optical imaging; Optical sensors; Vision defects; Diffraction gratings; Photolithography; aberration measurement;
Conference_Titel :
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-3829-7
Electronic_ISBN :
978-1-4244-3830-3
DOI :
10.1109/CLEOPR.2009.5292307
