DocumentCode
1978542
Title
Charge granularity in single electron transistors with polysilicon gates
Author
Kotekar-Patil, Dharmraj ; Jauerneck, Stefan ; Ruoff, Matthias ; Wharam, David ; Kern, Dieter ; Jehl, Xavier ; Wacquez, Romain ; Sanquer, M.
Author_Institution
Inst. for Appl. Phys., Univ. of Tubingen, Tubingen, Germany
fYear
2012
fDate
6-7 March 2012
Firstpage
89
Lastpage
92
Abstract
Low temperature electron transport measurements of single electron transistors fabricated in advanced CMOS technology with polysilicon gates not only exhibit clear Coulomb blockade behavior but also show a large number of additional conductance fluctuations in the nonlinear regime. By comparison with simulations these features are quantitatively attributed to the effects of discretely charged islands in the polysilicon gates.
Keywords
CMOS integrated circuits; single electron transistors; SET; advanced CMOS technology; charge granularity; clear Coulomb blockade behavior; conductance fluctuations; discretely charged islands; low temperature electron transport measurements; nonlinear regime; polysilicon gates; single electron transistors; Diamond-like carbon; Electric potential; Frequency measurement; Logic gates; Silicon; Temperature measurement; Transconductance; Coulomb blockade; MOSFETs; Single electron transistors; polysilicon charging;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultimate Integration on Silicon (ULIS), 2012 13th International Conference on
Conference_Location
Grenoble
Print_ISBN
978-1-4673-0191-6
Electronic_ISBN
978-1-4673-0190-9
Type
conf
DOI
10.1109/ULIS.2012.6193364
Filename
6193364
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