DocumentCode :
1978542
Title :
Charge granularity in single electron transistors with polysilicon gates
Author :
Kotekar-Patil, Dharmraj ; Jauerneck, Stefan ; Ruoff, Matthias ; Wharam, David ; Kern, Dieter ; Jehl, Xavier ; Wacquez, Romain ; Sanquer, M.
Author_Institution :
Inst. for Appl. Phys., Univ. of Tubingen, Tubingen, Germany
fYear :
2012
fDate :
6-7 March 2012
Firstpage :
89
Lastpage :
92
Abstract :
Low temperature electron transport measurements of single electron transistors fabricated in advanced CMOS technology with polysilicon gates not only exhibit clear Coulomb blockade behavior but also show a large number of additional conductance fluctuations in the nonlinear regime. By comparison with simulations these features are quantitatively attributed to the effects of discretely charged islands in the polysilicon gates.
Keywords :
CMOS integrated circuits; single electron transistors; SET; advanced CMOS technology; charge granularity; clear Coulomb blockade behavior; conductance fluctuations; discretely charged islands; low temperature electron transport measurements; nonlinear regime; polysilicon gates; single electron transistors; Diamond-like carbon; Electric potential; Frequency measurement; Logic gates; Silicon; Temperature measurement; Transconductance; Coulomb blockade; MOSFETs; Single electron transistors; polysilicon charging;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration on Silicon (ULIS), 2012 13th International Conference on
Conference_Location :
Grenoble
Print_ISBN :
978-1-4673-0191-6
Electronic_ISBN :
978-1-4673-0190-9
Type :
conf
DOI :
10.1109/ULIS.2012.6193364
Filename :
6193364
Link To Document :
بازگشت