Title :
A high power long pulse RF-driven H- source
Author :
Kwan, J.W. ; Ackerman, G.D. ; Cooper, W.S. ; deVries, G.J. ; Leung, K.N. ; Wells, R.P.
Author_Institution :
Lawrence Berkeley Lab., California Univ., Berkeley, CA, USA
Abstract :
We have tested the radio-frequency driven H- source and have shown that the H- production efficiency and the beam emittance are similar to those obtained from the filament discharge. Typically the numbers are 2.8 mA/cm2/kW and 0.017 π-mrad-cm (which corresponds to 1.9 eV) respectively. So far we have operated RF pulses of ≈10 kW for ≈50 ms with a porcelain-coated antenna and ≈15 kW for ≈1 s with additional layers of quartz sleeving. It is necessary to develop better antenna coating material that can withstand the intense plasma heating and sputtering in order to operate at higher power with longer pulse length
Keywords :
ion sources; 1 s; 1.9 eV; 10 kW; 15 kW; 50 ms; H; H- production efficiency; RF-driven H- source; antenna coating material; beam emittance; high power; long pulse; porcelain-coated antenna; Apertures; Circuits; Current transformers; Electron beams; Fault location; Ion sources; Plasma measurements; Power supplies; Production; Radio frequency;
Conference_Titel :
Particle Accelerator Conference, 1993., Proceedings of the 1993
Conference_Location :
Washington, DC
Print_ISBN :
0-7803-1203-1
DOI :
10.1109/PAC.1993.309589
