DocumentCode :
19792
Title :
Plasmonic Resonances in Nanostructured Transparent Conducting Oxide Films
Author :
Jongbum Kim ; Naik, Gururaj V. ; Emani, Naresh K. ; Guler, Urcan ; Boltasseva, Alexandra
Author_Institution :
Dept. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Volume :
19
Issue :
3
fYear :
2013
fDate :
May-June 2013
Firstpage :
4601907
Lastpage :
4601907
Abstract :
Transparent conducting oxides (TCOs) are emerging as possible alternative constituent materials to replace noble metals such as silver and gold for low-loss plasmonic and metamaterial (MM) applications in the near infrared regime (NIR). The optical characteristics of TCOs have been studied to evaluate the functionalities and potential of these materials as metal substitutes in plasmonic and MM devices, even apart from their usual use as electrode materials. However, patterning TCOs at the nanoscale, which is necessary for plasmonic and MM devices, is not well studied. This paper investigates nanopatterning processes for TCOs, especially the liftoff technique with electron-beam lithography, and the realization of plasmonic nanostructures with TCOs. By employing the developed nanopatterning process, we fabricate 2-D-periodic arrays of TCO nanodisks and characterize the material´s plasmonic properties to evaluate the performance of TCOs as metal substitutes. Light-induced collective oscillations of the free electrons in the TCOs (bulk plasmons) and localized surface plasmon resonances are observed in the wavelength range from 1.6 to 2.1 μm. Well-defined resonance peaks are observed, which can be dramatically tuned by varying the amount of dopant and by thermally annealing the TCO nanodisks in nitrogen gas ambient while maintaining the low-loss properties.
Keywords :
electron beam lithography; gold; metamaterials; nanopatterning; nanophotonics; optical fabrication; optical films; optical metamaterials; silver; Ag; Au; MM devices; TCO; electrode materials; electron-beam lithography; low-loss plasmonic; metamaterial; nanopatterning processes; nanostructured transparent conducting oxide films; near infrared regime; plasmonic nanostructures; plasmonic resonances; wavelength 1.6 mum to 2.1 mum; Indium tin oxide; Optical device fabrication; Optical films; Optical losses; Plasmons; Nanopatterning; plasmonics; transparent conductive oxides (TCOs);
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2013.2238611
Filename :
6415973
Link To Document :
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