DocumentCode
1979774
Title
Impact of nanoimprint lithography to device development
Author
Chou, Stephen Y.
Author_Institution
Dept. of Electr. Eng., Princeton Univ., NJ, USA
fYear
2003
fDate
23-25 June 2003
Firstpage
11
Abstract
In this paper, we review the status of nanoimprint lithography and its applications in nanodevices. In addition to sub-10 nm resolution, 3D patterning, and applications in other areas, we particularly discuss the fabrication of nanotransistors and circuits on 4 wafers using NIL at all lithography level and the fabrication of room temperature Si single electron transistors.
Keywords
elemental semiconductors; nanolithography; silicon; single electron transistors; 10 nm; 293 to 298 K; 3D patterning; Si; Si single electron transistors; circuits fabrications; nanodevices applications; nanoimprint lithography; nanotransistors fabrications; room temperature; Costs; Fabrication; Laboratories; Lithography; Manufacturing; Nanolithography; Optical materials; Research and development; Resists; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 2003
Print_ISBN
0-7803-7727-3
Type
conf
DOI
10.1109/DRC.2003.1226849
Filename
1226849
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