DocumentCode
1980433
Title
Manufacturing method of high frequency quartz oscillators over 1 GHz
Author
Nagaura, Yoshiaki ; Yokomizo, Seiichi
Author_Institution
Nagaura Lab. Co. Inc., Fukuoka, Japan
Volume
1
fYear
1999
fDate
1999
Firstpage
425
Abstract
In addition to the conventional methods of chemical etching and mechanical polishing, reactive ion etching (RIE) is proposed as a major production method of high frequency quartz oscillators. We have found that RIE, with the selection of a condition, is useful in the production of quartz oscillators, and that mechanical polishing is effective for the improvement of the characteristic
Keywords
UHF oscillators; crystal oscillators; electron device manufacture; polishing; sputter etching; 1 GHz; HF quartz oscillators; RIE; SiO2; high frequency quartz oscillators; manufacturing method; mechanical polishing; production method; reactive ion etching; Chemical processes; Chemical products; Electric variables; Frequency; Machining; Manufacturing; Oscillators; Production; Sputter etching; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency and Time Forum, 1999 and the IEEE International Frequency Control Symposium, 1999., Proceedings of the 1999 Joint Meeting of the European
Conference_Location
Besancon
ISSN
1075-6787
Print_ISBN
0-7803-5400-1
Type
conf
DOI
10.1109/FREQ.1999.840797
Filename
840797
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