• DocumentCode
    1980954
  • Title

    Metamorphic 6.0 /spl Aring/ narrow band gap HBT technology on InP substrates

  • Author

    Cavus, A. ; Sandhu, R. ; Monier, C. ; Pascua, D. ; Cox, C. ; Poust, B. ; Hsing, R. ; Noori, A. ; Hayashi, S. ; Goorsky, M. ; Gutierrez-Aitken, A.

  • Author_Institution
    Northrop Grumman Space Technol., Redondo Beach, CA
  • fYear
    0
  • fDate
    0-0 0
  • Firstpage
    381
  • Lastpage
    386
  • Abstract
    In0.86Al0.14As/In0.86Ga0.14 As double heterojunction bipolar transistors (DHBTs) were grown on InP substrates by using sub-micron 6.0 Aring metamorphic graded buffer layers. Good DC and RF characteristics have been demonstrated with a current gain of 30, low base-collector reverse leakage (<muA), low turn-on voltage (0.45 eV), practical breakdown voltage (~2.5 V), and peak frequencies fT and fMAX exceeding 150 GHz. Functional circuits with complexity ranging from 20 to 1100 devices have been successfully demonstrated with power dissipation reduced by a factor of two compared to equivalent circuits designed with conventional InP technology
  • Keywords
    III-V semiconductors; aluminium compounds; buffer layers; energy gap; gallium arsenide; heterojunction bipolar transistors; indium compounds; leakage currents; 0.45 eV; 6.0 angstrom; DC characteristics; In0.86Al0.14As-In0.86Ga0.14 As; In0.86Al0.14As/In0.86Ga0.14 As DHBT; In0.86Al0.14As/In0.86Ga0.14 As double heterojunction bipolar transistor; InP; InP substrates; RF characteristics; base-collector reverse leakage; complexity; current gain; functional circuits; metamorphic graded buffer layers; metamorphic narrow band gap HBT technology; peak frequency; power dissipation; practical breakdown voltage; turn-on voltage; Breakdown voltage; Buffer layers; Circuits; Double heterojunction bipolar transistors; Heterojunction bipolar transistors; Indium phosphide; Low voltage; Narrowband; Power dissipation; Radio frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials Conference Proceedings, 2006 International Conference on
  • Conference_Location
    Princeton, NJ
  • Print_ISBN
    0-7803-9558-1
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2006.1634196
  • Filename
    1634196