DocumentCode
1981395
Title
Odd aberration measurement of projection optics in lithographic tools based on dipole illumination
Author
Peng, Bo ; Wang, Xiangzhao ; Qiu, Zicheng ; Yuan, Qiongyan
Author_Institution
Inf. Opt. Lab., Chinese Acad. of Sci., Shanghai, China
fYear
2009
fDate
30-3 Aug. 2009
Firstpage
1
Lastpage
2
Abstract
Theoretical analysis of impact of illumination profile on measurement accuracy is given. A novel measurement technique using Alt-PSM marks under dipole illumination is proposed based on the analysis result.
Keywords
aberrations; optical projectors; photolithography; Alt-PSM marks; dipole illumination; illumination profile; image displacement; lithographic tools; odd aberration measurement; projection optics; Equations; Frequency; Image analysis; Image sampling; Laboratories; Lighting; Lithography; Measurement techniques; Mechanical variables measurement; Optical diffraction; Alt-PSM marks; dipole illumination; image displacement; odd aberration;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-3829-7
Electronic_ISBN
978-1-4244-3830-3
Type
conf
DOI
10.1109/CLEOPR.2009.5292630
Filename
5292630
Link To Document