• DocumentCode
    1981475
  • Title

    Reducing the complexity of defect level modeling using the clustering effect

  • Author

    de Sousa, José T. ; Agrawal, Vishwani D.

  • Author_Institution
    IST/INESC, Tech. Univ. Lisbon, Portugal
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    640
  • Lastpage
    644
  • Abstract
    Accounting for the clustering effect is fundamental to increasing the accuracy of defect level (DL) modeling. This result has long been known in yield modeling but, as far as known, only one DL model directly accounts for it. In this paper we improve this model, reducing its number of parameters from three to two by noticing that multiple faults caused by a single defect can also be modeled as additional clustering. Our result is supported by test data from a real production line
  • Keywords
    circuit optimisation; computational complexity; integrated circuit modelling; integrated circuit yield; probability; IC yield; clustering effect; defect level modeling; modelling complexity reduction; optimisation procedure; production line data; reject ratio; yield modeling; Bismuth;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design, Automation and Test in Europe Conference and Exhibition 2000. Proceedings
  • Conference_Location
    Paris
  • Print_ISBN
    0-7695-0537-6
  • Type

    conf

  • DOI
    10.1109/DATE.2000.840853
  • Filename
    840853