Title :
Fabrication process for optically low loss Si cantilever waveguide
Author :
Jiang, F. ; Keating, A. ; Martyniuk, M. ; Faraone, L. ; Dell, J.M.
Author_Institution :
Sch. of Electr., Univ. of Western Australia, Crawley, WA, Australia
fDate :
Aug. 28 2011-Sept. 1 2011
Abstract :
Finite difference time domain (FDTD) was used to model through a waveguide consisting of a deflecting cantilever butt-coupling into a fixed waveguide. Adequate dynamic range for signal modulation has been shown in the dependence of the signal transmitted power on the cantilever deflection has been presented for fabrication. Effects towards fabrication of modulated structure revealed stress gradients in SOI´s top Si layer that serves for cantilever structure.
Keywords :
cantilevers; elemental semiconductors; finite difference time-domain analysis; optical fabrication; optical waveguides; silicon; silicon-on-insulator; FDTD; SOI; Si; cantilever butt-coupling; cantilever deflection; cantilever waveguide; finite difference time domain; signal modulation; silicon-on-insulator; Integrated optics; Optical device fabrication; Optical sensors; Optical waveguides; Silicon;
Conference_Titel :
Quantum Electronics Conference & Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011
Conference_Location :
Sydney, NSW
Print_ISBN :
978-1-4577-1939-4
DOI :
10.1109/IQEC-CLEO.2011.6193708
