• DocumentCode
    1984998
  • Title

    Fabrication process for optically low loss Si cantilever waveguide

  • Author

    Jiang, F. ; Keating, A. ; Martyniuk, M. ; Faraone, L. ; Dell, J.M.

  • Author_Institution
    Sch. of Electr., Univ. of Western Australia, Crawley, WA, Australia
  • fYear
    2011
  • fDate
    Aug. 28 2011-Sept. 1 2011
  • Firstpage
    1351
  • Lastpage
    1353
  • Abstract
    Finite difference time domain (FDTD) was used to model through a waveguide consisting of a deflecting cantilever butt-coupling into a fixed waveguide. Adequate dynamic range for signal modulation has been shown in the dependence of the signal transmitted power on the cantilever deflection has been presented for fabrication. Effects towards fabrication of modulated structure revealed stress gradients in SOI´s top Si layer that serves for cantilever structure.
  • Keywords
    cantilevers; elemental semiconductors; finite difference time-domain analysis; optical fabrication; optical waveguides; silicon; silicon-on-insulator; FDTD; SOI; Si; cantilever butt-coupling; cantilever deflection; cantilever waveguide; finite difference time domain; signal modulation; silicon-on-insulator; Integrated optics; Optical device fabrication; Optical sensors; Optical waveguides; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quantum Electronics Conference & Lasers and Electro-Optics (CLEO/IQEC/PACIFIC RIM), 2011
  • Conference_Location
    Sydney, NSW
  • Print_ISBN
    978-1-4577-1939-4
  • Type

    conf

  • DOI
    10.1109/IQEC-CLEO.2011.6193708
  • Filename
    6193708
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1984998