Title :
Digital and analog integrated-circuit design with built-in reliability
Author :
Hsu, Wen-jay ; Sheu, Bing J. ; Tyree, Vance C.
Author_Institution :
Dept. of Electr. Eng., Univ. of Southern California, Los Angeles, CA, USA
Abstract :
A novel approach to the design of digital and analog VLSI with built-in reliability is presented. Physics-based reliability models for key failure mechanisms in VLSI circuits are used to achieve accurate and efficient circuit-level reliability prediction and improvement. A prototype integrated-circuit reliability simulator (RELY) and experimental results on hot-carrier damage and metal electromigration effects are presented
Keywords :
VLSI; circuit CAD; circuit reliability; digital integrated circuits; electromigration; hot carriers; linear integrated circuits; RELY; VLSI circuits; analog VLSI; analog integrated-circuit design; built-in reliability; circuit-level reliability improvement; circuit-level reliability prediction; digital VLSI; digital integrated-circuit design; failure mechanisms; hot-carrier damage; integrated-circuit reliability simulator; metal electromigration effects; physics based reliability models; Circuit simulation; Circuit testing; Computational modeling; Computer simulation; Electromigration; Failure analysis; Integrated circuit reliability; Predictive models; Stress; Very large scale integration;
Conference_Titel :
Computer Design: VLSI in Computers and Processors, 1989. ICCD '89. Proceedings., 1989 IEEE International Conference on
Conference_Location :
Cambridge, MA
Print_ISBN :
0-8186-1971-6
DOI :
10.1109/ICCD.1989.63416
