DocumentCode
1986971
Title
Optimization of a Schottky Mixer Diode for THz Heterodyne Detection
Author
Guoli, Fan ; Yuesong, Jiang ; Xiaosheng, Qu
Author_Institution
Sch. of Electron. & Inf. Eng., Beihang Univ., Beijing
Volume
1
fYear
2008
fDate
21-22 Dec. 2008
Firstpage
468
Lastpage
471
Abstract
We have designed a Schottky barrier mixer diode (SBD) for use in Terahertz (THz) heterodyne receivers with a structure optimized for high cut-off frequency and minimum conversion loss. In the THz rang, the conventional formulas describing diodes characteristics are invalid for several high frequency effects such as the skin effect and plasma resonance. The relations between these effects and doping density and operation frequency were thoroughly analyzed, and the cut-off frequency and conversion loss dependence on doping density of the epitaxial layer and anode diameter of SBD were analyzed and simulated. The results indicate that in the THz range, the substrate doping density and the epitaxial layer doping density are high enough and diode diameter is small enough to improve SBDpsilas performance, and operation above the plasma frequency is not a useful option. The optimization of the SBD structure shows an excellent agreement with experiment.
Keywords
Schottky barriers; Schottky diode mixers; heterodyne detection; skin effect; submillimetre wave mixers; Schottky barrier mixer diode optimization; anode diameter; epitaxial layer doping density; high cut-off frequency; minimum conversion loss; plasma resonance; skin effect; substrate doping density; terahertz heterodyne receivers; Cutoff frequency; Design optimization; Doping; Epitaxial layers; Frequency conversion; Mixers; Plasma density; Plasma simulation; Schottky barriers; Schottky diodes; SBD; THz; conversion loss; cut-off frequency; the plasma resonance;
fLanguage
English
Publisher
ieee
Conference_Titel
Education Technology and Training, 2008. and 2008 International Workshop on Geoscience and Remote Sensing. ETT and GRS 2008. International Workshop on
Conference_Location
Shanghai
Print_ISBN
978-0-7695-3563-0
Type
conf
DOI
10.1109/ETTandGRS.2008.142
Filename
5070197
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